Revealing the local crystallinity of single silicon core–shell nanowires using tip-enhanced Raman spectroscopy

• Marius van den Berg,
• Ardeshir Moeinian,
• Arne Kobald,
• Yu-Ting Chen,
• Anke Horneber,
• Steffen Strehle,
• Alfred J. Meixner and
• Dai Zhang

Beilstein J. Nanotechnol. 2020, 11, 1147–1156, doi:10.3762/bjnano.11.99

• -catalyzed vapor–liquid–solid growth and silicon overcoating by thermal chemical vapor deposition. Local changes in the fraction of crystallinity in these silicon nanowires are characterized at an optical resolution of about 300 nm. Furthermore, we are able to resolve the variations in the intensity ratios

Improved adsorption and degradation performance by S-doping of (001)-TiO₂

• Xiao-Yu Sun,
• Xian Zhang,
• Xiao Sun,
• Ni-Xian Qian,
• Min Wang and
• Yong-Qing Ma

Beilstein J. Nanotechnol. 2019, 10, 2116–2127, doi:10.3762/bjnano.10.206

• of Physical Science and Information Technology, Anhui University, Hefei 230039, China 10.3762/bjnano.10.206 Abstract In this work, sulfur-doped (S-doped) TiO2 with the (001) face exposed was synthesized by thermal chemical vapor deposition at 180 or 250 °C using S/Ti molar ratios RS/Ti of 0, 0.5, 1

• increase in the amount of •OH and •O2− radicals. Keywords: anatase; chemical state; degradation; photocatalytic properties; S-doping; thermal chemical vapor deposition; titanium dioxide (TiO2); Introduction Anatase TiO2 with a tetragonal symmetry has widely been used for the degradation of organic

• performed by thermal chemical vapor deposition. We observed that S-doping greatly enhances the photocatalytic performance of (001)-TiO2, and we revealed the related mechanism by a systematic investigation of the material. Experimental Synthesis of nanoparticles 20 mL of tetrabutyl titanate (TBT, 99

Formation mechanisms of boron oxide films fabricated by large-area electron beam-induced deposition of trimethyl borate

• Aiden A. Martin and
• Philip J. Depond

Beilstein J. Nanotechnol. 2018, 9, 1282–1287, doi:10.3762/bjnano.9.120

• and undergoes subsequent reaction with an electron beam. The process has major advantages over thermal chemical vapor deposition (CVD) processes one of which being that the substrate is not exposed to the elevated temperatures required for the thermal decomposition of precursor molecules. To date, the

3D Nanoprinting via laser-assisted electron beam induced deposition: growth kinetics, enhanced purity, and electrical resistivity

• Brett B. Lewis,
• Robert Winkler,
• Xiahan Sang,
• Pushpa R. Pudasaini,
• Michael G. Stanford,
• Harald Plank,
• Raymond R. Unocic,
• Jason D. Fowlkes and
• Philip D. Rack

Beilstein J. Nanotechnol. 2017, 8, 801–812, doi:10.3762/bjnano.8.83

• situation at elevated temperatures. MeCpPt(IV)Me3 was originally developed for use as a thermal chemical vapor deposition (CVD) precursor [75]; the thermal decomposition temperature on the order of 120 °C in the presence of H2 results in pure Pt films. Thus, with LAEBID we leverage the pulsed thermal energy

Gas sensing with gold-decorated vertically aligned carbon nanotubes

• Prasantha R. Mudimela,
• Mattia Scardamaglia,
• Oriol González-León,
• Nicolas Reckinger,
• Rony Snyders,
• Eduard Llobet,
• Carla Bittencourt and
• Jean-François Colomer

Beilstein J. Nanotechnol. 2014, 5, 910–918, doi:10.3762/bjnano.5.104

• Institute for Materials Science and Engineering, University of Mons, Mons, Belgium MINOS-EMaS, Universitat Rovira i Virgili, Tarragona, Spain 10.3762/bjnano.5.104 Abstract Vertically aligned carbon nanotubes of different lengths (150, 300, 500 µm) synthesized by thermal chemical vapor deposition and

Functionalization of vertically aligned carbon nanotubes

• Eloise Van Hooijdonk,
• Carla Bittencourt,
• Rony Snyders and
• Jean-François Colomer

Beilstein J. Nanotechnol. 2013, 4, 129–152, doi:10.3762/bjnano.4.14

• . This can be performed by thermal chemical vapor deposition (CVD) or plasma enhanced chemical vapor deposition (PECVD). The PECVD includes different plasma techniques, such as DC plasma [41], radio-frequency plasma [42], or microwave plasma [43]. The main difference is that the plasma in the PECVD